On Tuesday, October 14, 2025, an online lecture was delivered by Hlib Yevhenovych Polozhii, a practicing specialist and Junior Research Fellow at the Institute of Applied Physics of the National Academy of Sciences of Ukraine, on the topic “Proton Beam Lithography — a Technology for Fabrication of Micro- and Nanostructures.”
The lecture was conducted within the framework of the academic course “Solid-State Electronics” (lecturer — Prof. Anatolii Serhiiovych Opanasiuk) for students of the educational programs “Electronics,” “Electronic Systems,” and “Physical Electronics.” All interested participants were invited to attend the lecture, which was taken advantage of by several lecturers and staff members of the Department of Electronics and Computer Engineering, as well as external attendees.
The lecturer introduced the audience to a new lithography method — proton beam lithography. The principles of operation of the method and the equipment required for its implementation were discussed, and examples of the use of the technology for the creation of two-dimensional and three-dimensional objects were presented. The possibilities of focusing a proton beam down to dimensions of 10 × 10 nm were also highlighted.
The greatest interest was aroused by the lecturer’s information that research in this field in Ukraine is being carried out at a level comparable to that of such technologically advanced countries as Japan and the United States. Scientists in the city are developing a proton accelerator whose dimensions are comparable to those of an electron microscope.
The lecture generated considerable interest among the audience and concluded with a lively discussion and numerous questions addressed to the speaker.
